Dr. Rogier Groeneveld

Senior group manager – D&E EUV illumination and projection at ASML 

Dr. Groeneveld is currently a senior group manager within the D&E department of ASML, where he is responsible for the development of the main optical imaging systems for EUV Lithography. Developing these complex modules is done in close collaboration with Zeiss-SMT in Germany.

He received his PhD in experimental physics at the University of Amsterdam in 1992, after which he worked as a postdoc at IBM (USA), and the University of Nijmegen (NL). In 1998 he joined ASML. Since then, he held different positions as a project manager, both in the EUV and Twinscan programms.

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